Effect of Electron Beam Irradiation on PMMA Films

被引：5

作者：

Tiwari, Pragya ^{[1
]}

Srivastava, A. K. ^{[1
]}

Khattak, B. Q. ^{[1
]}

Verma, Suveer ^{[1
]}

Upadhyay, Anuj ^{[1
]}

Sinha, A. K. ^{[1
]}

Ganguli, Tapas ^{[1
]}

Lodha, G. S. ^{[1
]}

Deb, S. K. ^{[1
]}

机构：

[1] RRCAT, Indus Synchrotron Utilizat Div, Indore 452013, MP, India

来源：

SOLID STATE PHYSICS, PTS 1 AND 2 | 2012年 / 1447卷

关键词：

PMMA; electron beam lithography; FTIR;

D O I：

10.1063/1.4710140

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polymethyl methacrylate (PMMA) is characterized for electron beam interactions in the resist layer in lithographic applications. PMMA thin films (free standing) were prepared by solvent casting method. These films were irradiated with 30keV electron beam at different doses. Structural and chemical properties of the films were studied by means of X-ray diffraction and Fourier transform infra-red (FTIR) spectroscopy The XRD results showed that the amorphization increases with electron beam irradiation dose. FTIR spectroscopic analysis reveals that electron beam irradiation promotes the scission of carbonyl group and depletes hydrogen and converts polymeric structure into hydrogen depleted carbon network.

引用

页码：587 / 588

页数：2

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