Damage in a Thin Metal Film by High-Power Terahertz Radiation

被引：45

作者：

Agranat, M. B. ^{[1
]}

Chefonov, O. V. ^{[1
]}

Ovchinnikov, A. V. ^{[1
]}

Ashitkov, S. I. ^{[1
]}

Fortov, V. E. ^{[1
]}

Kondratenko, P. S. ^{[2
]}

机构：

[1] RAS, JIHT, Izhorskaya 13 Bldg 2, Moscow 125412, Russia

[2] RAS, NSI, Bolshaya Tulskaya St 52, Moscow 115191, Russia

来源：

PHYSICAL REVIEW LETTERS | 2018年 / 120卷 / 08期

基金：

俄罗斯科学基金会;

关键词：

LASER-PULSE; STRENGTH;

D O I：

10.1103/PhysRevLett.120.085704

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We report on the experimental observation of high-power terahertz-radiation-induced damage in a thin aluminum film with a thickness less than a terahertz skin depth. Damage in a thin metal film produced by a single terahertz pulse is observed for the first time. The damage mechanism induced by a single terahertz pulse could be attributed to thermal expansion of the film causing debonding of the film from the substrate, film cracking, and ablation. The damage pattern induced by multiple terahertz pulses at fluences below the damage threshold is quite different from that observed in single-pulse experiments. The observed damage pattern resembles an array of microcracks elongated perpendicular to the in-plane field direction. A mechanism related to microcracks' generation and based on a new phenomenon of electrostriction in thin metal films is proposed.

引用

页数：5

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