Landau and collisional damping induced power deposition for the m=0 mode of helicon and Trivelpiece-Gould waves in high density helicon plasmas

被引：3

作者：

Li, Wenqiu ^{[1
,2
,3
]}

Zhao, Bin ^{[1
]}

Wang, Gang ^{[1
,3
]}

Xiang, Dong ^{[4
]}

机构：

[1] Chinese Acad Sci, Inst Elect, Beijing 100094, Peoples R China

[2] Princeton Univ, Princeton Plasma Phys Lab, Princeton, NJ 08543 USA

[3] Univ Chinese Acad Sci, Sch Elect Elect & Commun Engn, Beijing 100049, Peoples R China

[4] Beijing Inst Aerosp Microelectromech Technol, Beijing 100094, Peoples R China

来源：

AIP ADVANCES | 2020年 / 10卷 / 08期

关键词：

GENERALIZED THEORY; ABSORPTION; EXCITATION; INSTABILITIES; PROPAGATION; SIMULATIONS; FREQUENCY; FIELD;

D O I：

10.1063/1.5143627

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

By considering the thermal and collisional effects in the analysis of power deposition properties of the helicon and Trivelpiece-Gould (TG) waves in radially uniform and high density (1 x 10(13) cm(-3)) helicon plasmas, theoretical calculations indicate that both the electron temperature and the applied magnetic field have great effects on the wave power deposition. Detailed investigations show that for a typical helicon plasma electron temperature range, 3 eV-5 eV, power deposition due to the TG wave has a dominant role compared to that of the helicon wave for moderate to large (B-0 >= 100 G) applied magnetic fields. Specifically, collisional damping induced TG wave power deposition dominates for the most of the electron temperature range.

引用

页数：8

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