Electrodeposition of Ru/Co compositionally modulated multilayers

被引：8
|
作者：
Juzikis, P [1 ]
Gudaviciute, L [1 ]
Messmer, A [1 ]
Kittel, MU [1 ]
机构：
[1] FORSCHUNGSINST EDELMET & MET CHEM,D-73525 SCHWABISCH GMUND,GERMANY
来源：
JOURNAL OF APPLIED ELECTROCHEMISTRY | 1997年 / 27卷 / 08期
关键词：
ruthenium; cobalt deposition; sulfate; sulfamate electrolyte; double-current pulse plating; modulated multilayers;
D O I：
10.1023/A:1018470122747
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Operating conditions for the production of thin coatings of ruthenium-cobalt alloys have already been achieved. The present work provides data on the electrodeposition of modulated ruthenium-cobalt alloys using a sulfate-sulfamate electrolyte and a double-current pulse plating technique. Alloy modulation was examined by glow discharge optical spectroscopy. Coulometric measurements during anodic dissolution of cobalt-ruthenium films make it possible to determine exactly the cobalt content and approximate amount of ruthenium in the films.
引用
收藏
页码：991 / 994
页数：4
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