Electrodeposition of Ru/Co compositionally modulated multilayers

被引：8

作者：

Juzikis, P ^{[1
]}

Gudaviciute, L ^{[1
]}

Messmer, A ^{[1
]}

Kittel, MU ^{[1
]}

机构：

[1] FORSCHUNGSINST EDELMET & MET CHEM,D-73525 SCHWABISCH GMUND,GERMANY

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1997年 / 27卷 / 08期

关键词：

ruthenium; cobalt deposition; sulfate; sulfamate electrolyte; double-current pulse plating; modulated multilayers;

D O I：

10.1023/A:1018470122747

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Operating conditions for the production of thin coatings of ruthenium-cobalt alloys have already been achieved. The present work provides data on the electrodeposition of modulated ruthenium-cobalt alloys using a sulfate-sulfamate electrolyte and a double-current pulse plating technique. Alloy modulation was examined by glow discharge optical spectroscopy. Coulometric measurements during anodic dissolution of cobalt-ruthenium films make it possible to determine exactly the cobalt content and approximate amount of ruthenium in the films.

引用

页码：991 / 994

页数：4

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