Characteristics of fire and explosion in semiconductor fabrication processes

被引:17
作者
Chen, JR [1 ]
机构
[1] Natl Kaohsiung First Univ Sci & Technol, Dept Safety Hlth & Environm Engn, Kaohsiung 824, Taiwan
关键词
D O I
10.1002/prs.680210106
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The characteristics of fire and explosion in semiconductor fabrication processes differ from those in the chemical process industries. Case studies are given to illustrate the common, as well as peculiar features of fire and explosion in the fabrication processes. In particular; the process exhaust systems, usually involving flammable, pyrophoric and corrosive,gases and vapors, were shown to be a major fire and explosion source. With some preliminary understanding of the semiconductor process, standard chemical process safety knowledge can be readily applied to semiconductor processes.
引用
收藏
页码:19 / 25
页数:7
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