Hydrogen plasma resistive and highly textured SnO2:F/ZnO:In bilayer films prepared by the pyrosol method

被引：8

作者：

Lee, CH ^{[1
]}

Lim, KS ^{[1
]}

Song, S ^{[1
]}

机构：

[1] KOREA ATOM ENERGY RES INST,NEW ENERGY RES DEPT,YUSONG GU,TAEJON 305343,SOUTH KOREA

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 7A期

关键词：

zinc oxide; tin oxide; transparent conducting oxide; pyrosol spraysis; bilayer; hydrogen plasma; transmittance; resistivity;

D O I：

10.1143/JJAP.36.4418

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Indium doped ZnO (ZnO:In) thin films were prepared on corning 7059 glass by the pyrosol method and the hydrogen plasma durability of the films nias investigated. We found that the ZnO:In films prepared at the higher substrate temperature of 425 degrees C to 475 degrees C have better hydrogen plasma durability because its denser surface with smaller grain boundary region kept energetic hydrogen ions from diffusing into the grain boundaries. Two kinds of SuO(2):F/ZnO:In bilayer films were fabricated at the temperature of 425 degrees C through a successive process by the pyrosol method: the SnO2:F/ZnO:In with thin (580 Angstrom) ZnO:In and the SnO2:F/ZnO:In with thick (2000 Angstrom) ZnO:In. The former has excellent durability owing to its thin (580 Angstrom) ZnO:In layer which acts as a barrier against hydrogen ions. It has a resistivity of 6.6 x 10(-4) Omega cm and a transmittance of 83.8% at the wavelength of 550 nm. The latter is a bilayer film of the SnO2:F/ZnO:In with thick (2000 Angstrom) ZnO:Iu which acts not only as a barrier but as a light scattering layer due to the highly textured thick (2000 Angstrom) ZnO:In film.

引用

页码：4418 / 4422

页数：5

共 6 条

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