Fabrication of Transparent Antifouling Thin Films with Fractal Structure by Atmospheric Pressure Cold Plasma Deposition

被引:9
|
作者
Miyagawa, Hayato [1 ]
Yamauchi, Koji [1 ]
Kim, Yoon-Kee [2 ]
Ogawa, Kazufumi [1 ]
Yamaguchi, Kenzo [1 ]
Suzaki, Yoshifumi [1 ]
机构
[1] Kagawa Univ, Fac Engn, Dept Adv Mat Sci, Takamatsu, Kagawa 7610396, Japan
[2] Hanbat Natl Univ, Dept Prod Sci & Welding Engn, Taejon 305764, South Korea
关键词
D O I
10.1021/la303316w
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Antifouling surface with both superhydrophobicity and oil-repellency has been fabricated on glass substrate by forming fractal microstructure(s). The fractal microstructure was constituted by transparent silica particles of 100 nm diameter and transparent zinc-oxide columns grown on silica particles by atmospheric pressure cold plasma deposition. The sample surface was coated with a chemically adsorbed monomolecular layer. We found that one sample has the superhydrophobic ability with a water droplet contact angle of more than 150 degrees, while another sample has a high transmittance of more than 85% in a wavelength range from 400 to 800 nm.
引用
收藏
页码:17761 / 17765
页数:5
相关论文
共 50 条
  • [31] Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
    Seongchan Kang
    Rodolphe Mauchauffé
    Yong Sung You
    Se Youn Moon
    Scientific Reports, 8
  • [32] Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
    Kang, Seongchan
    Mauchauffe, Rodolphe
    You, Yong Sung
    Moon, Se Youn
    SCIENTIFIC REPORTS, 2018, 8
  • [33] Effect of substrate temperature on ZnO thin film fabrication by using an atmospheric pressure cold plasma generator
    Suzaki, Yoshifumi
    Kawaguchi, Akiou
    Murase, Takehiko
    Yuji, Toshifumi
    Shikama, Tomokazu
    Shin, Dong-Bum
    Kim, Yoon-Kee
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 2, 2011, 8 (02): : 503 - 505
  • [34] Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets
    Kuchakova, Iryna
    Ionita, Maria Daniela
    Ionita, Eusebiu-Rosini
    Lazea-Stoyanova, Andrada
    Brajnicov, Simona
    Mitu, Bogdana
    Dinescu, Gheorghe
    De Vrieze, Mike
    Cvelbar, Uros
    Zille, Andrea
    Leys, Christophe
    Yu Nikiforov, Anton
    MATERIALS, 2020, 13 (06)
  • [35] Thin organic films by atmospheric-pressure ion deposition
    Saf, R
    Goriup, M
    Steindl, T
    Hamedinger, TE
    Sandholzer, D
    Hayn, G
    NATURE MATERIALS, 2004, 3 (05) : 323 - 329
  • [36] Thin organic films by atmospheric-pressure ion deposition
    Robert Saf
    Marian Goriup
    Thomas Steindl
    Thomas E. Hamedinger
    Daniel Sandholzer
    Gertraude Hayn
    Nature Materials, 2004, 3 : 323 - 329
  • [37] Deposition of diamond films in arc plasma jet at atmospheric pressure
    Gregor, I
    Jakubova, I
    Senk, J
    Hrabovsky, M
    Kolman, B
    Konrád, M
    Kopecky, V
    Vorlícek, V
    Pokorny, J
    CZECHOSLOVAK JOURNAL OF PHYSICS, 2002, 52 : 878 - 885
  • [38] Atmospheric pressure plasma deposition of organic films of biomedical interest
    Da Ponte, G.
    Sardella, E.
    Fanelli, F.
    Van Hoeck, A.
    d'Agostino, R.
    Paulussen, S.
    Favia, P.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S525 - S528
  • [39] Deposition of plasma polymer films by an atmospheric pressure glow discharge
    Foest, R
    Sigeneger, F
    Schmidt, M
    GASEOUS DIELECTRICS IX, 2001, : 113 - 118
  • [40] Atmospheric plasma deposition of transparent semiconducting ZnO films on plastics in ambient air
    Watanabe, Makoto
    Cui, Linying
    Dauskardt, Reinhold H.
    ORGANIC ELECTRONICS, 2014, 15 (03) : 775 - 784