Characteristics of a low-frequency-driven ferroinductor-coupled discharge

被引:6
作者
Felsteiner, J [1 ]
Slutsker, YZ [1 ]
Vaisberg, PM [1 ]
机构
[1] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
关键词
D O I
10.1063/1.2128474
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present characteristics of a low-frequency (LF) inductively coupled discharge where, instead of using an inductorlike rf antenna, we used a ferromagnetic core with a primary winding ("ferroinductor"). A dense (> 10(12) cm(-3)), highly ionized (30%-40%) plasma was obtained in this ferroinductor at gas pressures as low as 10(-4) Torr. In a wide range of comparatively low frequencies the core and winding losses were found to be small compared with the LF driving power delivered to the plasma. The driving frequency could be very low compared with typical inductively coupled discharges. The input impedance was found to be almost purely active (cos phi approximate to 0.9), and it was possible to achieve various input resistances (e.g., 50 Omega) in the whole investigated range of frequencies, powers, and pressures, which made unnecessary any matching box between the LF driver and the ferroinductor-coupled plasma device. Such a combination of properties makes this kind of discharge attractive for many applications. (c) 2005 American Institute of Physics.
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页数:5
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共 9 条
  • [1] BEGAMUDRE RD, 1988, ELECT MECH ENERGY CO, pCH8
  • [2] Ferroinductor coupled discharge
    Bliokh, YP
    Felsteiner, J
    Slutsker, YZ
    Vaisberg, PM
    [J]. APPLIED PHYSICS LETTERS, 2004, 85 (09) : 1484 - 1486
  • [3] CHEN X, 2003, SEMICONDUCTOR MAGAZI, P4
  • [4] Denisov V. P., 1984, Soviet Journal of Plasma Physics, V10, P486
  • [5] GINZBURG VL, 1961, PROPAGATION ELECTROM, pCH2
  • [6] Observation of the ponderomotive effect in an inductive plasma
    Godyak, V
    Piejak, R
    Alexandrovich, B
    Smolyakov, A
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (03) : 459 - 462
  • [7] Experimental setup and electrical characteristics of an inductively coupled plasma
    Godyak, VA
    Piejak, RB
    Alexandrovich, BM
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) : 703 - 712
  • [8] Review of inductively coupled plasmas for plasma processing
    Hopwood, J.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (02) : 109 - 116
  • [9] The physics of discharge lamps
    Lister, GG
    Lawler, JE
    Lapatovich, WP
    Godyak, VA
    [J]. REVIEWS OF MODERN PHYSICS, 2004, 76 (02) : 541 - 598