Calibrated scanning force microscope with capabilities in the subnanometre range

被引:11
作者
Hasche, K
Herrmann, K
Mirandé, W
Seemann, R
Vitushkin, L
Xu, M
Yu, G
机构
[1] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany
[2] Bur Int Poids & Mesures, Sevres, France
[3] Tsing Hua Univ, Beijing 100084, Peoples R China
[4] Tianjin Univ, Tianjin 300072, Peoples R China
关键词
scanning force microscopy; traceability of measurement results; calibration; subnanometre uncertainty;
D O I
10.1002/sia.1164
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper refers to quantitative scanning force microscopy (SFM) and dimensional measurement being traceable to metrological standards. The traceability to the unit of length is achieved by calibration of several thousands of selected and sufficiently defined reference positions within the three-dimensional measuring range by three miniature laser interferometers and their output signals at distances of lambda/2 (lambda corresponds to the wavelength of the He/Ne laser radiation). The expanded uncertainty U of the laser interferometer output signals is estimated to be less than or equal to1 run. The results reported here refer to the reduction of uncertainty in the subnanometre range by comparisons of measured periods of one-dimensional sinusoidal gratings using optical diffractometry with expanded uncertainties less than or equal to0.1 nm, as well as SFM with an uncertainty originally estimated to be 1 nm. The goal is to reduce as far as possible the uncertainty of the SFM measurement results, e.g. the thickness of films or the pitch of gratings. The present state of work allows to estimate an expanded uncertainty of <0.4 nm and it is hoped to reach a value near the picometre range. The practical goal is to apply this microscopy to evaluations (calibrations) of dimensional parameters of objects in the semiconductor technology and other dimensional micro- and nanostructures. Copyright (C) 2002 John Wiley Sons, Ltd.
引用
收藏
页码:71 / 74
页数:4
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