Low-temperature aqueous solution processed fluorine-doped zinc tin oxide thin-film transistors

被引:20
作者
Jeon, Jun-Hyuck [1 ]
Hwang, Young Hwan [1 ]
Jin, JungHo [1 ]
Bae, Byeong-Soo [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, LOMC, Taejon 305701, South Korea
基金
新加坡国家研究基金会;
关键词
SOL-GEL; ZNO; XPS;
D O I
10.1557/mrc.2012.1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Novel fluorine-doped zinc tin oxide (ZTO: F) thin-film transistors (TFTs) have been fabricated using an aqueous solution process. Exploiting hydrolysis and condensation reactions in an aqueous solution process, organic-free ZTO: F thin films were fabricated at a low temperature of 250 degrees C. The fabricated TFT device shows a field-effect mobility of 2.85 cm(2)/V s, on-to-off current ratios exceeding 10(7), and sub-threshold swings of 0.83 V/dec. The ZTO: F TFT also displays high operational stability of Delta V-th = 1.73 V despite incorporation of a large amount of fluorine and use of a low-temperature annealing process. This is attributed to effective passivation of oxygen vacancy diffusion by metal fluoride bonds at the ZTO: F channel/gate dielectric interface.
引用
收藏
页码:17 / 22
页数:6
相关论文
共 24 条
[1]   Spray-Deposited Li-Doped ZnO Transistors with Electron Mobility Exceeding 50 cm2/Vs [J].
Adamopoulos, George ;
Bashir, Aneeqa ;
Thomas, Stuart ;
Gillin, William P. ;
Georgakopoulos, Stamatis ;
Shkunov, Maxim ;
Baklar, Mohamed A. ;
Stingelin, Natalie ;
Maher, Robert C. ;
Cohen, Lesley F. ;
Bradley, Donal D. C. ;
Anthopoulos, Thomas D. .
ADVANCED MATERIALS, 2010, 22 (42) :4764-+
[2]   Electronic properties of ZnO field-effect transistors fabricated by spray pyrolysis in ambient air [J].
Adamopoulos, George ;
Bashir, Aneeqa ;
Woebkenberg, Paul H. ;
Bradley, Donal D. C. ;
Anthopoulos, Thomas D. .
APPLIED PHYSICS LETTERS, 2009, 95 (13)
[3]   A High Performance Inkjet Printed Zinc Tin Oxide Transparent Thin-Film Transistor Manufactured at the Maximum Process Temperature of 300°C and Its Stability Test [J].
Avis, Christophe ;
Jang, Jin .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 14 (02) :J9-J11
[4]   Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a 'sol-gel on chip' process [J].
Banger, K. K. ;
Yamashita, Y. ;
Mori, K. ;
Peterson, R. L. ;
Leedham, T. ;
Rickard, J. ;
Sirringhaus, H. .
NATURE MATERIALS, 2011, 10 (01) :45-50
[5]  
Brinker CJ, 1990, SOL GEL SCI, P42
[6]   High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer [J].
Chiang, HQ ;
Wager, JF ;
Hoffman, RL ;
Jeong, J ;
Keszler, DA .
APPLIED PHYSICS LETTERS, 2005, 86 (01) :013503-1
[7]  
Hayashi Y, 2004, VACUUM, V74, P607, DOI [10.1016/j.vacuum.2004.01.033, 10.1019/j.vacuum.2004.01.033]
[8]   Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors [J].
Jeong, Jae Kyeong ;
Yang, Hui Won ;
Jeong, Jong Han ;
Mo, Yeon-Gon ;
Kim, Hye Dong .
APPLIED PHYSICS LETTERS, 2008, 93 (12)
[9]   Bias-Stress-Stable Solution-Processed Oxide Thin Film Transistors [J].
Jeong, Youngmin ;
Bae, Changdeuck ;
Kim, Dongjo ;
Song, Keunkyu ;
Woo, Kyoohee ;
Shin, Hyunjung ;
Cao, Guozhong ;
Moon, Jooho .
ACS APPLIED MATERIALS & INTERFACES, 2010, 2 (03) :611-615
[10]   F1s XPS of fluoride glasses and related fluoride crystals [J].
Kawamoto, Y ;
Ogura, K ;
Shojiya, M ;
Takahashi, M ;
Kadono, K .
JOURNAL OF FLUORINE CHEMISTRY, 1999, 96 (02) :135-139