Growth and structure of singly oriented single-layer tungsten disulfide on Au(111)

被引:27
作者
Bignardi, Luca [1 ,2 ]
Lizzit, Daniel [1 ]
Bana, Harsh [2 ,8 ]
Travaglia, Elisabetta [2 ]
Lacovig, Paolo [1 ]
Sanders, Charlotte E. [3 ,9 ]
Dendzik, Maciej [3 ,10 ]
Michiardi, Matteo [3 ,11 ]
Bianchi, Marco [3 ]
Ewert, Moritz [4 ,5 ]
Buss, Lars [4 ]
Falta, Jens [4 ,5 ]
Flege, Jan Ingo [4 ,5 ,12 ]
Baraldi, Alessandro [1 ,2 ,6 ]
Larciprete, Rosanna [7 ]
Hofmann, Philip [3 ]
Lizzit, Silvano [1 ]
机构
[1] Elettra Sincrotrone Trieste SCpA, AREA Sci Pk,Str Statale 14,Km 163-5, I-34149 Trieste, Italy
[2] Univ Trieste, Dept Phys, Via Valerio 2, I-34127 Trieste, Italy
[3] Aarhus Univ, Dept Phys & Astron, Interdisciplinary Nanosci Ctr iNANO, Ny Munkegade 120, DK-8000 Aarhus C, Denmark
[4] Univ Bremen, Inst Solid State Phys, Otto Hahn Allee 1, D-28359 Bremen, Germany
[5] MAPEX Ctr Mat & Proc, Bremen, Germany
[6] CNR, Lab TASC, IOM, AREA Sci Pk,Str Statale 14,Km 163-5, I-34149 Trieste, Italy
[7] CNR, Inst Complex Syst, Via Taurini 19, I-00185 Rome, Italy
[8] Katholieke Univ Leuven, Inst Kern Stralingsfys, Dept Phys & Astron, Celestijnenlaan 200D, B-3001 Leuuven, Belgium
[9] Cent Laser Facil STFC Rutherford Appleton Lab, Didcot OX11 0QX, Berks, England
[10] Fritz Haber Inst Max Planck Soc, Dept Phys Chem, Faradayweg 4-6, D-14915 Berlin, Germany
[11] Univ British Columbia, Quantum Matter Inst, 2355 East Mall, Vancouver, BC V6T 1Z4, Canada
[12] Brandenburg Univ Technol Cottbus Senftenberg, Inst Phys, Konrad Zuse Str, D-03046 Cottbus, Germany
关键词
EPITAXIAL-GROWTH; VALLEY POLARIZATION; MOS2; OPTOELECTRONICS;
D O I
10.1103/PhysRevMaterials.3.014003
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A singly oriented, single layer of tungsten disulfide (WS2) was epitaxially grown on Au(111) and characterized at the nanoscale by combining photoelectron spectroscopy, photoelectron diffraction, and low-energy electron microscopy. Fast x-ray photoelectron spectroscopy revealed that the growth of a single crystalline orientation is triggered by choosing a low W evaporation rate and performing the process with a high temperature of the substrate. Information about the single orientation of the layer was obtained by acquiring x-ray photoelectron diffraction patterns, revealing a 1H polytype for the WS2 layer and, moreover, determining the structural parameters and registry with the substrate. The distribution, size, and orientation of the WS2 layer were further ascertained by low-energy electron microscopy.
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页数:8
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