Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device

被引：0

作者：

Amako, Jun ^{[1
]}

Shinozaki, Yu ^{[1
]}

机构：

[1] Toyo Univ, Grad Sch Sci & Engn, 2100 Kujirai, Kawagoe, Saitama 3508585, Japan

来源：

OPTICAL MICROLITHOGRAPHY XXIX | 2016年 / 9780卷

关键词：

diffractive optical elements; dual-wavelength functionality; multi-level surface profiles; maskless lithography; digital micromirror device; PHASE ELEMENTS; OPERATION;

D O I：

10.1117/12.2229178

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper, we demonstrate a dual-wavelength diffractive beam splitter to be used in parallel laser processing. The novel optical element, which is formed in a transparent material, generates two beam arrays at different wavelengths and allows their overlap at the process points on a workpiece. Since the splitter has a stochastically designed, complex, and deep surface profile, there is limited freedom in selecting a fabrication method. We designed the splitter using a simulated annealing algorithm and fabricated it in a photoresist through maskless exposure by using a digital micromirror device. We characterized the designed splitter, thereby corroborating the proposed beam-splitting concept.

引用

页数：7