Synthesis of crystalline structures of Cnx thin films deposited on sapphire, quartz and alumina substrates

被引：0
|
作者：
Alexandrescu, R [1 ]
Cireasa, R [1 ]
Crunteanu, A [1 ]
Cojocaru, CS [1 ]
Morjan, I [1 ]
Kumar, A [1 ]
Vasiliu, F [1 ]
机构：
[1] Natl Inst Lasers Plasma & Radiat Phys, Lasers Dept, R-76900 Bucharest, Romania
来源：
PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS | 1999年 / 555卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Carbon nitride films raise current interest for their potential applications as ultra-ard materials. We report on the formation of crystalline CN structures in films deposited at 248 nm on different substrates (sapphire, quartz, alumina) using the laser-induced CVD method and a gas mixture containing ethylene/nitrous oxide and ammonia as carbon and nitrogen source, respectively. The structural and morphological properties of the films were characterized by different analytical techniques (SEM, TEM, TED and XPS).
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页码：413 / 418
页数：6
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