Synthesis of crystalline structures of Cnx thin films deposited on sapphire, quartz and alumina substrates

被引：0

作者：

Alexandrescu, R ^{[1
]}

Cireasa, R ^{[1
]}

Crunteanu, A ^{[1
]}

Cojocaru, CS ^{[1
]}

Morjan, I ^{[1
]}

Kumar, A ^{[1
]}

Vasiliu, F ^{[1
]}

机构：

[1] Natl Inst Lasers Plasma & Radiat Phys, Lasers Dept, R-76900 Bucharest, Romania

来源：

PROPERTIES AND PROCESSING OF VAPOR-DEPOSITED COATINGS | 1999年 / 555卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Carbon nitride films raise current interest for their potential applications as ultra-ard materials. We report on the formation of crystalline CN structures in films deposited at 248 nm on different substrates (sapphire, quartz, alumina) using the laser-induced CVD method and a gas mixture containing ethylene/nitrous oxide and ammonia as carbon and nitrogen source, respectively. The structural and morphological properties of the films were characterized by different analytical techniques (SEM, TEM, TED and XPS).

引用

页码：413 / 418

页数：6

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