Investigation of optical properties of multilayer dielectric structures using prism-coupling technique

被引：5

作者：

Sokolov, V. I. ^{[1
]}

Glebov, V. N. ^{[1
]}

Malyutin, A. M. ^{[1
]}

Molchanova, S. I. ^{[1
]}

Khaydukov, E. V. ^{[1
]}

Panchenko, V. Ya ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Laser & Informat Technol, Shatura 140700, Moscow Region, Russia

来源：

QUANTUM ELECTRONICS | 2015年 / 45卷 / 09期

基金：

俄罗斯科学基金会;

关键词：

multilayer dielectric structure; prism-coupling technique; measurement of thin-film parameters; FILMS; THICKNESS;

D O I：

10.1070/QE2015v045n09ABEH015852

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A method based on resonant excitation of waveguide modes with a prism coupler is proposed for measuring the thickness and refractive index of thin-film layers in multilayer dielectric structures. The peculiarities of reflection of TE- and TM-polarised light beams from a structure comprising eleven alternating layers of zinc sulfide (ZnS) and magnesium barium fluoride (MgBaF4), whose thicknesses are much less than the wavelength of light, are investigated. Using the mathematical model developed, we have calculated the coefficients of reflection of collimated TE and TM light beams from a multilayer structure and determined the optical constants and thicknesses of the structure layers. The refractive indices of the layers, obtained for TE and TM polarisation of incident light, are in good agreement. The thicknesses of ZnS and MgBaF4 layers, found for different polarisations, coincide with an accuracy of +/- 1 %. Thus, we have demonstrated for the first time that the prism-coupling technique allows one to determine the optical properties of thin-film structures when the number of layers in the structure exceeds ten layers.

引用

页码：868 / 872

页数：5

共 14 条

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