Rapid Micro-Scale Patterning of Alkanethiolate Self-Assembled Monolayers on Au Surface by Atmospheric Micro-Plasma Stamp

被引:4
作者
Weng, Chih-Chiang [1 ,2 ]
Hsueh, Jen-Chih [2 ]
Liao, Jiunn-Der [1 ,2 ]
Chen, Chia-Hao [3 ]
Yoshimura, Masahiro [1 ,2 ]
机构
[1] Natl Cheng Kung Univ, Promot Ctr Global Mat Res, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 70101, Taiwan
[3] Natl Synchrotron Radiat Res Ctr, Hsichu 30076, Taiwan
关键词
dielectric barrier discharges (DBD); micropatterning; micro-plasma stamp; pattern transferring; self-assembled monolayers; SCANNING-ELECTRON-MICROSCOPY; RADICAL-DOMINANT PLASMA; POSITIVE RESIST; MICROPLASMAS; IRRADIATION; CONTRAST; THIOL; FILMS;
D O I
10.1002/ppap.201200151
中图分类号
O59 [应用物理学];
学科分类号
摘要
A dielectric barrier discharge-based micro-plasma stamp is used to transfer a micro-scale pattern onto ultra-thin octadecanethiolate (ODT) self-assembled monolayers chemically adsorbed on Au (111). The results show that the specified pattern was transferred onto ODT/Au with a distortion rate of less than 1% and no significant changes in the imprint dimensions. The adsorbates formed during plasma treatment or exposure to air affected the transfer of patterns. The wet-etching rate for the washed and patterned ODT/Au surface increased 1.6-fold compared to that for the unwashed one. The boundary of the underlaying Au pattern with plasma exposure increased approximate to 3% due to lateral diffusion of the Au etching solution.
引用
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页码:345 / 352
页数:8
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