Doubly charged negative silicon-carbon clusters produced in sputtering

被引:36
作者
Gnaser, H [1 ]
机构
[1] Univ Kaiserslautern, Fachbereich Phys, D-67663 Kaiserslautern, Germany
[2] Univ Kaiserslautern, Inst Oberflachen & Schichtanalyt, D-67663 Kaiserslautern, Germany
来源
PHYSICAL REVIEW A | 1999年 / 60卷 / 04期
关键词
D O I
10.1103/PhysRevA.60.R2645
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Small doubly charged negative cluster ions SiCn2- (with n = 6, 8, and 10) are produced by sputtering the surface of a SiC specimen with a 14.5-keV Cs+-ion beam. They are detected in a double-focusing mass spectrometer that covers a dynamic abundance range of about 10(9). The emission yields of these dianionic clusters amount to roughly 10(-4) of the corresponding singly charged cluster ions. For both types of ion species, the abundance distributions decrease monotonically with an increasing number of C atoms in the cluster. This observation is ascribed to fragmentation processes that are due to the high amount of internal energy relayed to the cluster species in the sputtering event. Apart from this decomposition caused by excitation, the flight time through the mass spectrometer of similar to 15 mu s establishes a lower limit with respect to the intrinsic lifetimes of both the singly and doubly charged ions. [S1050-2947(99)50510-6].
引用
收藏
页码:R2645 / R2648
页数:4
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