Measurements of surface resistance for Nb thin films in millimeter wavelength region using resonator coupled Josephson junctions.

被引：1
|
作者：
Kawakami, A
Wang, Z
机构：
[1] Kansai Advanced Research Center, Communications Research Laboratory, Kobe-shi, 651-24
来源：
PHYSICA C | 1997年 / 282卷
关键词：
D O I：
10.1016/S0921-4534(97)01338-5
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Josephson junctions with a microstrip resonator have been fabricated to measure surface resistances of Nb thin films. Current steps that depend on the loss of the resonator are observed in the I-V curve at the voltage corresponding to the resonant frequency. Surface resistance of Nb thin films are estimated as 1.8 to 20 m Omega at 65-300 GHz using a resonator shunted junction (RLCSJ) model.
引用
收藏
页码：2533 / 2534
页数：2
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