Application of graphene oxide for reduction of thermal resistance of high-power laser diodes

被引:2
作者
Dabrowska, E. [1 ]
Teodorczyk, M. [1 ]
Lipinska, L. [1 ]
Kozinski, R. [1 ]
Malag, A. [1 ]
机构
[1] Inst Elect Mat Technol, PL-01919 Warsaw, Poland
关键词
cooling; drying; red shift; semiconductor lasers; thermal resistance; graphene; thermal resistance reduction; high power laser diodes; removal efficiency; upper heat flux; graphene oxide deposit; aqueous suspension; drying process; step-by-step processing; temperature 293 K to 298 K; CO;
D O I
10.1049/el.2013.3273
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Improvement of the removal efficiency of the upper (directed towards the n-side) heat flux from high-power laser diodes is proposed by providing the graphene-oxide (GO) deposit from the top of the p-down-mounted chips. Resulting decrease of the device's thermal resistance has been found in reduced red shift of the spectral characteristics connected with the drive current increase (compared with no GO deposit' device). Providing GO in the form of aqueous suspension and then drying at room temperature is relatively easy and repeatable. Experimental step-by-step processing and characterisations indicate dominant heat removal from the chip's side walls rather than from its n-contact surface.
引用
收藏
页码:1550 / 1551
页数:2
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