Double-peak distribution of electron and ion emission profile during femtosecond laser ablation of metals

被引:62
作者
Amoruso, S
Wang, X
Altucci, C
de Lisio, C
Armenante, M
Bruzzese, R
Spinelli, N
Velotta, R
机构
[1] Univ Basilicata, Dipartimento Ingn & Fis Ambiente, I-85100 Potenza, Italy
[2] Ist Nazl Fis Nucl, Sezione Napoli, I-80126 Naples, Italy
[3] Univ Basilicata, Dipartimento Chim, I-85100 Potenza, Italy
[4] Univ Naples Federico II, Dipartimento Sci Fis, I-80126 Naples, Italy
[5] Univ Naples Federico II, INFM, I-80126 Naples, Italy
关键词
ultrashort laser ablation; time-of-flight technique;
D O I
10.1016/S0169-4332(01)00679-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Femtosecond laser ablation of metals with a Ti:sapphire laser system has been investigated by a time-of-flight mass spectroscopy technique, Ion mass spectra show a double-peak distribution, evidencing the presence of a high-energy component (up to few keV). even at moderate laser intensities (10(12)-10(13) W cm(-2)). Two different ablation regimes were identified for the less energetic component, and explained in the framework of the two-temperature modeling of ultrashort laser pulse-solid target interactions. Ambipolar diffusion has been identified as the probable mechanism giving rise to the observed high-energy plasma plume component. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:358 / 363
页数:6
相关论文
共 15 条
  • [1] Thermal and nonthermal ion emission during high-fluence femtosecond laser ablation of metallic targets
    Amoruso, S
    Wang, X
    Altucci, C
    de Lisio, C
    Armenante, M
    Bruzzese, R
    Velotta, R
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (23) : 3728 - 3730
  • [2] Femtosecond laser ablation of gallium arsenide investigated with time-of-flight mass spectroscopy
    Cavalleri, A
    Sokolowski-Tinten, K
    Bialkowski, J
    von der Linde, D
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (19) : 2385 - 2387
  • [3] CHICHCOV BN, 1996, APPL PHYS A, V63, P103
  • [4] Ablation characteristics of Au, Ag, and Cu metals using a femtosecond Ti:sapphire laser
    Furusawa, K
    Takahashi, K
    Kumagai, H
    Midorikawa, K
    Obara, M
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1): : S359 - S366
  • [5] OXIDE SUPERCONDUCTOR AND MAGNETIC METAL THIN-FILM DEPOSITION BY PULSED-LASER ABLATION - A REVIEW
    JACKSON, TJ
    PALMER, SB
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (08) : 1581 - 1594
  • [6] Temporal contrast in Ti:Sapphire lasers:: Characterization and control
    Nantel, M
    Itatani, J
    Tien, AC
    Faure, J
    Kaplan, D
    Bouvier, M
    Buma, T
    Van Rompay, P
    Nees, J
    Pronko, PP
    Umstadter, D
    Mourou, GA
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (02) : 449 - 458
  • [7] Ablation of metals by ultrashort laser pulses
    Nolte, S
    Momma, C
    Jacobs, H
    Tunnermann, A
    Chichkov, BN
    Wellegehausen, B
    Welling, H
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1997, 14 (10) : 2716 - 2722
  • [8] THERMOPHYSICAL EFFECTS IN LASER PROCESSING OF MATERIALS WITH PICOSECOND AND FEMTOSECOND PULSES
    PRONKO, PP
    DUTTA, SK
    DU, D
    SINGH, RK
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (10) : 6233 - 6240
  • [9] INCONGRUENT TRANSFER IN LASER DEPOSITION OF FESIGARU THIN-FILMS
    VANDERIET, E
    KOOLS, JCS
    DIELEMAN, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (12) : 8290 - 8296
  • [10] EJECTION OF POSITIVE-IONS FROM PLASMAS INDUCED BY LASER-ABLATION OF SI AND ND1.85CE0.15CUO4
    VANINGEN, RP
    [J]. JOURNAL OF APPLIED PHYSICS, 1994, 76 (12) : 8055 - 8064