Pulsed laser deposited TiO2 films: Tailoring optical properties

被引：16

作者：

Dzibrou, D. ^{[1
]}

Grishin, A. M. ^{[1
]}

Kawasaki, H. ^{[2
]}

机构：

[1] Royal Inst Technol, Dept Condensed Matter Phys, SE-16440 Stockholm, Sweden

[2] Sasebo Natl Coll Technol Sasebo, Nagasaki 8571193, Japan

来源：

THIN SOLID FILMS | 2008年 / 516卷 / 23期

关键词：

Rutile; Anatase; Pulsed laser deposition; Rapid thermal annealing; Refractive index; Absorption coefficient; Surface roughness;

D O I：

10.1016/j.tsf.2008.05.010

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiO2 amorphous films have been pulsed laser deposited onto glass substrates. Film characterization by X-ray diffraction, atomic force microscopy and transmission spectroscopy was performed with the aim of extracting the information on the film crystalline structure, surface roughness and optical properties. Three methods for improving film optical performance have been employed, namely deposition at elevated temperatures, post-annealing in thermodynamically equilibrium conditions and rapid thermal annealing (RTA). The best characteristics were achieved in the case of the film subjected to RTA at 500 degrees C: refractive index n = 2.53, absorption coefficient alpha = 404 cm(-1) at lambda = 550 nm and rms surface roughness as low as 0.6 run. The results obtained were found to be one of the best published so far. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：8697 / 8701

页数：5

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