Full-three dimensional quantum approach to evaluate the surface-roughness-limited magnetoresistance mobility in SNWT

被引:4
作者
Buran, C. [1 ]
Pala, M. G. [1 ]
Bescond, M. [2 ]
Mouis, M. [1 ]
机构
[1] IMEP LAHC MINATEC UMR CNRS INPG UJF, F-38016 Grenoble, France
[2] L2MP, F-13384 Marseille, France
关键词
Nanowire; Quantum simulation; Magnetoconductance; Surface roughness;
D O I
10.1007/s10825-008-0196-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a theoretical method to simulate magnetotransport in silicon nanowire (Si-NW) MOSFET including the effect of Surface Roughness (SR). We use a full three dimensional (3D) real-space self-consistent Poisson-Schrodinger solver based on Non Equilibrium Green's function Formalism (NEGF) which can treat the influence of an external magnetic field on the device. By comparing magnetoconductance curves with the classical Drude formula we extract magnetoresistance (MR) mobility for nanowires with and without roughness. From the preliminary results it seems that the MR mobility is not dramatically reduced for the SR parameters considered in this work.
引用
收藏
页码:328 / 331
页数:4
相关论文
共 25 条
[1]   3D quantum modeling and simulation of multiple-gate nanowire MOSFETs [J].
Bescond, M ;
Nehari, K ;
Autran, JL ;
Cavassilas, N ;
Munteanu, D ;
Lannoo, M .
IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, :617-620
[2]   Differential magnetoresistance technique for mobility extraction in ultra-short channel FDSOI transistors [J].
Chaisantikulwat, W. ;
Mouis, M. ;
Ghibaudo, G. ;
Gallon, C. ;
Fenouillet-Beranger, C. ;
Maude, D. K. ;
Skotnicki, T. ;
CristoloveanU, S. .
SOLID-STATE ELECTRONICS, 2006, 50 (04) :637-643
[3]   Functional nanoscale electronic devices assembled using silicon nanowire building blocks [J].
Cui, Y ;
Lieber, CM .
SCIENCE, 2001, 291 (5505) :851-853
[4]  
Ferry DK, 1997, TRANSPORT NANOSTRUCT
[5]   TRANSPORT IN THE INVERSION LAYER OF A MOS-TRANSISTOR - USE OF KUBO-GREENWOOD FORMALISM [J].
GHIBAUDO, G .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1986, 19 (05) :767-780
[6]   SURFACE-ROUGHNESS AT THE SI(100)-SIO2 INTERFACE [J].
GOODNICK, SM ;
FERRY, DK ;
WILMSEN, CW ;
LILIENTAL, Z ;
FATHY, D ;
KRIVANEK, OL .
PHYSICAL REVIEW B, 1985, 32 (12) :8171-8186
[7]   Modeling of electron mobility in gated silicon nanowires at room temperature: Surface roughness scattering, dielectric screening, and band nonparabolicity [J].
Jin, Seonghoon ;
Fischetti, Massimo V. ;
Tang, Ting-Wei .
JOURNAL OF APPLIED PHYSICS, 2007, 102 (08)
[8]   A three-dimensional simulation of quantum transport in silicon nanowire transistor in the presence of electron-phonon interactions [J].
Jin, Seonghoon ;
Park, Young June ;
Min, Hong Shick .
JOURNAL OF APPLIED PHYSICS, 2006, 99 (12)
[10]   Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations [J].
Luisier, Mathieu ;
Schenk, Andreas ;
Fichtner, Wolfgang .
APPLIED PHYSICS LETTERS, 2007, 90 (10)