Femtosecond laser-induced removal of silicon nitride layers from doped and textured silicon wafers used in photovoltaics

被引：34
作者：
Bonse, J. [1 ]
Mann, G. [1 ]
Krueger, J. [1 ]
Marcinkowski, M. [2 ]
Eberstein, M. [2 ]
机构：
[1] BAM Bundesanstalt Mat Forsch & Prufung, D-12205 Berlin, Germany
[2] Fraunhofer Inst Keram Technol & Syst IKTS, D-01277 Dresden, Germany
来源：
THIN SOLID FILMS | 2013年 / 542卷
关键词：
Photovoltaics; Solar cell; Laser processing; FS-laser ablation; Silicon nitride; SOLAR-CELLS; THIN-FILMS; ABLATION; MECHANISMS;
D O I：
10.1016/j.tsf.2013.07.005
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The removal of a 75- to 90-nm-thick passivating silicon nitride antireflection coating from standard textured multicrystalline silicon photovoltaic wafers with a typical diffused 90-Omega/sq-emitter upon irradiation with near-infrared femtosecond laser pulses (790 nm central wavelength, 30 fs pulse duration) is studied experimentally. The laser irradiation areas are subsequently characterized by complementary optical microscopy, scanning electron microscopy and depth profiling chemical analyses using secondary ion mass spectrometry. The results clarify the thin-film femtosecond laser ablation scenario and outline the process windows for selective antireflection coating removal. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：420 / 425
页数：6
相关论文
共 28 条
  • [1] [Anonymous], PROCEEDINGS OF THE 3
  • [2] Bahr M., 2010, 25 EUR PHOT SOL EN C, P2490
  • [3] Bauerle D., 2013, Laser Processing and Chemistry
  • [4] Laser-silicon interaction for selective emitter formation in photovoltaics. I. Numerical model and validation
    Blecher, J. J.
    Palmer, T. A.
    DebRoy, T.
    [J]. JOURNAL OF APPLIED PHYSICS, 2012, 112 (11)
  • [5] Femtosecond laser damage of a high reflecting mirror
    Bonse, J
    Baudach, S
    Kautek, W
    Welsch, E
    Krüger, J
    [J]. THIN SOLID FILMS, 2002, 408 (1-2) : 297 - 301
  • [6] Probing the heat affected zone by chemical modifications in femtosecond pulse laser ablation of titanium nitride films in air
    Bonse, Joern
    Krueger, Joerg
    [J]. JOURNAL OF APPLIED PHYSICS, 2010, 107 (05)
  • [7] Thin film removal mechanisms in ns-laser processing of photovoltaic materials
    Bovatsek, J.
    Tamhankar, A.
    Patel, R. S.
    Bulgakova, N. M.
    Bonse, J.
    [J]. THIN SOLID FILMS, 2010, 518 (10) : 2897 - 2904
  • [8] Laser precision engineering: from microfabrication to nanoprocessing
    Chong, Tow C.
    Hong, Minghui H.
    Shi, Luping P.
    [J]. LASER & PHOTONICS REVIEWS, 2010, 4 (01) : 123 - 143
  • [9] Laser scribing of polycrystalline thin films
    Compaan, AD
    Matulionis, I
    Nakade, S
    [J]. OPTICS AND LASERS IN ENGINEERING, 2000, 34 (01) : 15 - 45
  • [10] Correia S. A. G. D., 2007, 22 EUR PHOT SOL EN C, P1061
123