Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays

被引：19
|
作者：
Gu, Weiyin [1 ]
Xu, Ji [1 ]
Kim, Jung-Keun [1 ]
Hong, Sung Woo [1 ]
Wei, Xinyu [1 ]
Yang, Xiaomin [2 ]
Lee, Kim Y. [2 ]
Kuo, David S. [2 ]
Xiao, Shuaigang [2 ]
Russell, Thomas P. [1 ]
机构：
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Seagate Technol, Fremont, CA 94538 USA
来源：
ADVANCED MATERIALS | 2013年 / 25卷 / 27期
关键词：
block copolymers; directed self-assembly; solvent annealing; nanodots; bit-patterned media; THIN-FILMS; TEMPERATURE-DEPENDENCE; TRANSITION BEHAVIOR; ORIENTATION; PATTERNS; LITHOGRAPHY; POLYSTYRENE; NANOSTRUCTURES; DISORDER; PHASE;
D O I：
10.1002/adma.201300899
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The fabrication process for 5 Tb/in2 bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block- polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：3677 / 3682
页数：6
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