Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays

被引：19

作者：

Gu, Weiyin ^{[1
]}

Xu, Ji ^{[1
]}

Kim, Jung-Keun ^{[1
]}

Hong, Sung Woo ^{[1
]}

Wei, Xinyu ^{[1
]}

Yang, Xiaomin ^{[2
]}

Lee, Kim Y. ^{[2
]}

Kuo, David S. ^{[2
]}

Xiao, Shuaigang ^{[2
]}

Russell, Thomas P. ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

[2] Seagate Technol, Fremont, CA 94538 USA

来源：

ADVANCED MATERIALS | 2013年 / 25卷 / 27期

关键词：

block copolymers; directed self-assembly; solvent annealing; nanodots; bit-patterned media; THIN-FILMS; TEMPERATURE-DEPENDENCE; TRANSITION BEHAVIOR; ORIENTATION; PATTERNS; LITHOGRAPHY; POLYSTYRENE; NANOSTRUCTURES; DISORDER; PHASE;

D O I：

10.1002/adma.201300899

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The fabrication process for 5 Tb/in2 bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block- polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：3677 / 3682

页数：6

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