共 24 条
Surface properties of diamond-like carbon films prepared by CVD and PVD methods
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作者:

Liu, DP
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机构:
Dalian Natl Unv, Dept Math & Phys, Dalian 116600, Peoples R China Dalian Natl Unv, Dept Math & Phys, Dalian 116600, Peoples R China

Liu, YH
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机构: Dalian Natl Unv, Dept Math & Phys, Dalian 116600, Peoples R China

Chen, BX
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机构: Dalian Natl Unv, Dept Math & Phys, Dalian 116600, Peoples R China
机构:
[1] Dalian Natl Unv, Dept Math & Phys, Dalian 116600, Peoples R China
[2] Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China
来源:
CHINESE PHYSICS
|
2006年
/
15卷
/
03期
关键词:
diamond-like carbon film;
film deposition;
atomic force microscope;
D O I:
暂无
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
Diamond-like carbon (DLC) films have been deposited using three different techniques: (a) electron cyclotron resonance-plasma source ion implantation, (b) low-pressure dielectric barrier discharge, (c) filtered-pulsed cathodic arc discharge. The surface and mechanical properties of these films are compared using atomic force microscope-based tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and spa hybridized carbon while the soft surface layers of tetrahedral amorphous carbon (ta-C) films have graphite-like structure. The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and spa hybridized carbon enriched surface layers. The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.
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页码:575 / 579
页数:5
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