Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

被引：439

作者：

Homoelle, D ^{[1
]}

Wielandy, S

Gaeta, AL

Borrelli, NF

Smith, C

机构：

[1] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA

[2] Corning Inc, Glass & Glass Ceram Res, Corning, NY 14831 USA

来源：

OPTICS LETTERS | 1999年 / 24卷 / 18期

关键词：

D O I：

10.1364/OL.24.001311

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We investigate the use of infrared femtosecond laser pulses to induce highly localized refractive-index changes in fused-silica glasses. We characterize the magnitude of the change as a function of exposure and measure index changes as large as 3 x 10(-3) and 5 x 10(-3) in pure fused silica and boron-doped silica, respectively. The potential of this technique for writing three-dimensional photonic structures in bulk glasses is demonstrated by the fabrication of a Y coupler within a sample of pure fused silica. (C) 1999 Optical Society of America OCIS codes: 320.7130, 190.4180, 230.4000, 230.7370, 160.2750.

引用

页码：1311 / 1313

页数：3

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