Excimer lasers enable next-generation ICs

被引：0
|
作者：
Das, P
Rebitz, K
机构：
来源：
LASER FOCUS WORLD | 1997年 / 33卷 / 06期
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D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Deep-UV laser sources are replacing mercury arc lamps currently used with lithography tools to manufacture state-of-the-art semiconductor chips.
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页码：89 / &
页数：5
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