Silicon nitride anti-reflection coating on the glass and transparent conductive oxide interface for thin film solar cells and modules

被引：19

作者：

Iwahashi, T. ^{[1
]}

Morishima, M. ^{[1
]}

Fujibayashi, T. ^{[1
]}

Yang, R. ^{[1
]}

Lin, J. ^{[1
]}

Matsunaga, D. ^{[1
]}

机构：

[1] Tokyo Electron Ltd, Nirasaki City, Yamanashi, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 2015年 / 118卷 / 14期

关键词：

CHEMICAL-VAPOR-DEPOSITION; HYDROGEN CONTENT; PASSIVATION; EFFICIENCY; ELECTRODE; LAYER; RATIO; BULK;

D O I：

10.1063/1.4932639

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Anti-reflection coating (ARC) is well known as an important technique to enhance solar cell performance. Typical ARC has been applied on the glass surface to reduce light reflection loss at the air/glass interface. However, reflection loss occurs not only at glass surface but also at other interfaces such as glass/transparent conductive oxide (TCO) interface. The refractive index of SiNx is tunable from 1.6 to 2.7, and the range from 1.7 to 2.0 is suitable for ARC at glass/TCO interface. In this study, we examined the AR effect of silicon nitride (SiNx) deposited by plasma enhanced chemical vapor deposition at the glass/TCO interface with thin film silicon solar cell and module. Reflectivity reduction of 1.6% for glass/ZnO substrate has been obtained with optimal SiNx layer, which contribute 2.0% gain in cell efficiency. Besides, we also confirmed the relative efficiency gain of around 2% for large-sized solar module, leading to a world-record large area stabilized module conversion efficiency of 12.34%. (C) 2015 AIP Publishing LLC.

引用

页数：8

共 47 条

[1]

[Anonymous], 2013, P 28 EUROPEAN PHOTOV

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