Low temperature dielectric relaxation and charged defects in ferroelectric thin films

被引：7

作者：

Artemenko, A. ^{[1
]}

Payan, S. ^{[1
]}

Rousseau, A. ^{[1
]}

Levasseur, D. ^{[1
,2
]}

Arveux, E. ^{[1
]}

Guegan, G. ^{[2
]}

Maglione, M. ^{[1
]}

机构：

[1] CNRS, ICMCB, UPR 9048, F-33600 Pessac, France

[2] STMicroelectronics, F-37071 Tours, France

来源：

AIP ADVANCES | 2013年 / 3卷 / 04期

关键词：

barium compounds; ferroelectric thin films; sol-gel processing; sputter deposition; titanium compounds; NANOPOWDERS; SPECTRA;

D O I：

10.1063/1.4802242

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We report a dielectric relaxation in BaTiO3-based ferroelectric thin films of different composition and with several growth modes: sputtering (with and without magnetron) and sol-gel. The relaxation was observed at cryogenic temperatures (T < 100 K) for frequencies from 100 Hz up to 10 MHz. This relaxation activation energy is always lower than 200 meV and is very similar to the relaxation that we reported in the parent bulk perovskites. Based on our Electron Paramagnetic Resonance (EPR) investigation, we ascribe this dielectric relaxation to the hopping of electrons among Ti3+-V(O) charged defects. Being dependent on the growth process and on the amount of oxygen vacancies, this relaxation can be a useful probe of defects in actual integrated capacitors with no need for specific shaping. Copyright 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License. [http://dx.doi.org/10.1063/1.4802242]

引用

页数：8

共 22 条

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