Enhancement of piezoelectric response of diluted Ta doped AlN

被引:44
|
作者
Liu, Hongyan [1 ]
Zeng, Fei [1 ]
Tang, Guangsheng [1 ]
Pan, Feng [1 ]
机构
[1] Tsinghua Univ, Dept Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China
基金
中国国家自然科学基金;
关键词
Piezoelectric response; Ta; AlN; THIN-FILMS; STRESS;
D O I
10.1016/j.apsusc.2013.01.005
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The authors have investigated the variation of microstructure and piezoelectric response of TaxAl1-xN films with Ta concentrations. The results indicate that moderate Ta doping facilitates the c-axis orientation, crystallinity and enlargement of lattice constants. When the doping content is about 5.1 at.%, the c-axis orientation is optimized in the best with c constant of about 0.5086 nm. The Raman spectra of TaxAl1-xN films further determine the wurtzite structure of AlN after Ta doping. The high resolution transmission electric microscopy demonstrates that the column single crystal was obtained with presence of nano distortion domains. The Ta 4f(7/2) binding energy of TaxAl1-xN shows a shift toward lower binding energy side, indicating that the coordination configuration of Ta with N changed as Ta contents increased. A significant enhancement in piezoelectric response was obtained from 4.2 pC/N to 8.2 pC/N, which is enhanced by ca. 100%, when the Ta content arrived to 5.1 at.%. The expansion of unit cell volume and the competition between Ta and Al atoms about the coordination of nitrogen atoms, which will enhance the internal nitrogen displacement under electric field, are proposed to be the main microscopic origin of the enhancement of piezoelectric response. (C) 2013 Elsevier B. V. All rights reserved.
引用
收藏
页码:225 / 230
页数:6
相关论文
共 50 条
  • [31] Piezoelectric properties and residual stress of sputtered AlN thin films for MEMS applications
    Iborra, E
    Olivares, J
    Clement, M
    Vergara, L
    Sanz-Hervás, A
    Sangrador, J
    SENSORS AND ACTUATORS A-PHYSICAL, 2004, 115 (2-3) : 501 - 507
  • [32] Enhanced piezoelectric response of AlN via alloying of transitional metals, and influence of type and distribution of transition metals
    Zha, Xian-Hu
    Ma, Xiufang
    Luo, Jing-Ting
    Fu, Chen
    NANO ENERGY, 2023, 111
  • [33] Growth mechanism and field emission of B doped AlN films
    Redjdal, N.
    Azzaz, M.
    Salah, H.
    Ouarab, N.
    Manseri, A.
    Keffous, A.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2024, 300
  • [34] The ohmic character of doped AlN films
    Okamoto, M
    Yap, YK
    Yoshimura, M
    Mori, Y
    Sasaki, T
    DIAMOND AND RELATED MATERIALS, 2001, 10 (3-7) : 1322 - 1325
  • [35] Doping Engineering for Optimizing Piezoelectric and Elastic Performance of AlN
    Yu, Xi
    Zhu, Lei
    Li, Xin
    Zhao, Jia
    Wu, Tingjun
    Yu, Wenjie
    Li, Weimin
    MATERIALS, 2023, 16 (05)
  • [36] From Simulation to Manufacturing of Piezoelectric Micromachined AlN Membrane
    Ekwinska, Magdalena A.
    Zajac, Jerzy
    Zaborowski, Michal
    Szmigiel, Dariusz
    MECHATRONICS 2017: RECENT TECHNOLOGICAL AND SCIENTIFIC ADVANCES, 2018, 644 : 699 - 707
  • [37] Improvement of the piezoelectric response of AlN thin films through the evaluation of the contact surface potential by piezoresponse force microscopy
    Signore M.A.
    Francioso L.
    De Pascali C.
    Serra A.
    Manno D.
    Rescio G.
    Quaranta F.
    Melissano E.
    Velardi L.
    Vacuum, 2023, 218
  • [38] Enhancement of ferroelectric and piezoelectric characteristics in europium substituted SrBi2Ta2O9 ferroelectric ceramics
    Coondoo, Indrani
    Jha, A. K.
    MATERIALS LETTERS, 2009, 63 (01) : 48 - 50
  • [39] Structure and properties of Ta doped TiN films prepared using different sputtering powers for Ta target
    Wang, Yuemeng
    Shi, Xinwei
    Liu, Miaomiao
    Yang, Yifan
    Gao, Qilong
    Zhu, Bailin
    Xu, Liujie
    PROCESSING AND APPLICATION OF CERAMICS, 2022, 16 (03) : 191 - 200
  • [40] DETERMINATION OF PHYSICAL RESPONSE IN (Mo/AlN) SAW DEVICES
    Caicedo, J. C.
    Perez, J. A.
    Caicedo, H. H.
    Riascos, H.
    SURFACE REVIEW AND LETTERS, 2013, 20 (02)