Ion etching for sharp tip features on titanium and the response of cells to these surfaces

被引：7

作者：

Riedel, Nicholas A. ^{[1
]}

Bechara, Samuel L. ^{[2
]}

Popat, Ketul C. ^{[1
,2
]}

Williams, John D. ^{[1
]}

机构：

[1] Colorado State Univ, Dept Mech Engn, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Sch Biomed Engn, Ft Collins, CO 80523 USA

来源：

MATERIALS LETTERS | 2012年 / 81卷

基金：

美国国家科学基金会;

关键词：

Titanium; Oblique angle; Ion etching; Sharp tip; Implant;

D O I：

10.1016/j.matlet.2012.04.147

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Oblique angle ion etching at incidences of 30 degrees and 75 degrees from surface normal were used to produce sharp tipped topographical features on Ti6Al4V alloy. The 30 degrees etching resulted in a random distribution of needles raising similar to 4 mu m from the base surface, while needles from the 75 degrees etching laid closer to the surface. The cellular response of these surfaces was evaluated by a weeklong culture of hFOB 1.19 cells. It was shown that the features of the 30 degrees etch prevented cells from spreading while cells on the 75 degrees etched surface displayed preferential elongation in the direction of the needles. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：158 / 161

页数：4

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