Preparation of Na-β-alumina films by laser chemical vapor deposition

This study demonstrates the growth of Na-beta-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (T-dep), molar ratio of Na/Al (R-Na/Al) and total pressure (P-tot) on the phase formation, microstructure, orientations and deposition rate (R-dep) of the film. Single-phase Na-beta-alumina films were deposited at (T-dep) = 1310 K-1360 K,R-Na/Al> 20 and P-tot> 600 Pa. Na-beta-alumina films with the hexagonally faceted platelet morphology were deposited at P-tot = 1000 Pa, whereas flake-like grains were formed at P-tot = 600 Pa. Na-beta-alumina was co-deposited with alpha-Al2O3 at P-tot <600 Pa and T-dep > 1350 K, in which the film morphology showed flake-like grains with smaller granules. The maximum R-dep of Na-beta-alumina films was 44 mu m h(-1). (C) 2015 Elsevier B.V. All rights reserved.