32 and 45 nm Radiation-Hardened-by-Design (RHBD) SOI Latches

被引:50
作者
Rodbell, Kenneth P. [1 ]
Heidel, David F. [1 ]
Pellish, Jonathan A. [2 ]
Marshall, Paul W. [3 ]
Tang, Henry H. K. [1 ]
Murray, Conal E. [1 ]
LaBel, Kenneth A. [2 ]
Gordon, Michael S. [1 ]
Stawiasz, Kevin G. [1 ]
Schwank, James R. [4 ]
Berg, Melanie D. [5 ]
Kim, Hak S. [5 ]
Friendlich, Mark. R. [5 ]
Phan, Anthony M. [5 ]
Seidleck, Christina M. [5 ]
机构
[1] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[2] NASA, Goddard Space Flight Ctr, Greenbelt, MD 20771 USA
[3] NASA, Brookneal, VA 24528 USA
[4] Sandia Natl Labs, Albuquerque, NM 87175 USA
[5] MEI Technol, Seabrook, MD 20706 USA
关键词
32 nm and 45 nm SOI hardened latches; angle dependent cross-section distributions; heavy ion modeling; sensitive node separation; silicon-on-insulator technology (SOI); single event upset (SEU); single event effects (SEE); track structures; SINGLE-EVENT-UPSETS; ION TRACKS; HEAVY-ION; SILICON; ENERGY; ELECTRON;
D O I
10.1109/TNS.2011.2171715
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Single event upset (SEU) experimental heavy ion data and modeling results for CMOS, silicon-on-insulator (SOI), 32 nm and 45 nm stacked and DICE latches are presented. Novel data analysis is shown to be important for hardness assurance where Monte Carlo modeling with a realistic heavy ion track structure, along with a new visualization aid (the Angular Dependent Cross-section Distribution, ADCD), allows one to quickly assess the improvements, or limitations, of a particular latch design. It was found to be an effective technique for making SEU predictions for alternative 32 nm SOI latch layouts.
引用
收藏
页码:2702 / 2710
页数:9
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