In situ growth of isotopically enriched 28Si nanowires using the floating-zone (FZ) melting method

被引:7
作者
Hu, QL
Li, GQ
Suzuki, H
Araki, H
Noda, T
机构
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
[2] Japan Sci & Technol Corp, Kawaguchi, Saitama 3320012, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2002年 / 41卷 / 1AB期
关键词
isotopically enriched silicon; nanowires; floating-zone melting;
D O I
10.1143/JJAP.41.L7
中图分类号
O59 [应用物理学];
学科分类号
摘要
Isotopically enriched Si-28 nanowires have been synthesized using a simple and noncontaminating floating-zone (FZ) method. The growth of the nanowires was performed in the top area, 1.5-2 cm from the floating melting zone (2 mm width) of a raw material bar under a flow of Ar gas. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) analyses revealed that the nanowires of isotopically enriched Si-28 crystalline had diameters ranging from 20-50 nm. The special shape of the tip of the isotopically enriched Si-28 nanowires was observed to reveal the isotopic effect on the growth of nanowires.
引用
收藏
页码:L7 / L9
页数:3
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