Extremely stable temperature characteristics of 1550-nm band, p-doped, highly stacked quantum-dot laser diodes

被引:24
作者
Matsumoto, Atsushi [1 ]
Akahane, Kouichi [1 ]
Umezawa, Toshimasa [1 ]
Yamamoto, Naokatsu [1 ]
机构
[1] Natl Inst Informat & Commun Technol NICT, Koganei, Tokyo 1848795, Japan
关键词
SEMICONDUCTOR OPTICAL AMPLIFIERS; QD-SOA; MODULATION;
D O I
10.7567/JJAP.56.04CH07
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricated 1.55-mu m band, broad-area, p-doped, 30-layer stacked quantum-dot (QD) laser diodes (LDs) grown on an InP(311)B substrate via a delta-doping method employing a strain compensation technique. We doped Be atoms to a depth of 5 nm from the bottom of each QD layer. The concentration of Be atoms doped in the InGaAlAs spacer layer was 1 x 10-(18) cm(-3). We observed a strong photoluminescence emission and a relatively coherent surface of QDs using atomic force microscopy. In addition, we observed that the fabricated QD-LDs had extremely stable temperature characteristics, and a characteristic temperature T-0 of more than 2156K was obtained. (C) 2017 The Japan Society of Applied Physics
引用
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页数:5
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