Near-field polarization distribution of Si nanoparticles near substrate

被引:2
作者
Reshetov, S. A. [1 ,2 ]
Vladimirova, Yu. V. [1 ,2 ]
Gevorkian, L. P. [3 ]
Zadkov, V. N. [1 ,2 ,3 ,4 ]
机构
[1] Lomonosov Moscow State Univ, Int Laser Ctr, Moscow 119991, Russia
[2] Lomonosov Moscow State Univ, Fac Phys, Moscow 119991, Russia
[3] Lomonosov Moscow State Univ, Kolmogorov Sch, Moscow 119991, Russia
[4] RAS, Inst Spect, Moscow 108840, Russia
来源
XXV-TH CONGRESS ON SPECTROSCOPY | 2017年 / 132卷
关键词
D O I
10.1051/epjconf/201713203006
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Structure of the near-field intensity and polarization distributions, the latter is described with the generalized 3D Stokes parameters, of a spherical Si subwavelength nanoparticle in a nonmagnetic and non-absorbing media near a dielectric substrate has been studied in detail with the help of the Mie theory and an extension of the Weyl's method for the calculation of the reflection of dipole radiation by a flat surface. It is shown that for the nanoparticle near the substrate the interference effects due to the scattering by the nanoparticle and interaction with the substrate play an essential role. We also demonstrate how these effects depend on the dielectric properties of the nanoparticle, its size, distance to the substrate as well as on the polarization, wavelength and incident angle of the external light field.
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页数:2
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