Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors

被引：34

作者：

Fu, Richard ^{[1
]}

Pattison, James ^{[1
]}

机构：

[1] USA, Res Lab, Adelphi, MD 20783 USA

来源：

OPTICAL ENGINEERING | 2012年 / 51卷 / 10期

关键词：

atomic layer deposition; plasma enhanced atomic layer deposition; Al2O3; film; mercury cadmium telluride; ATOMIC LAYER DEPOSITION;

D O I：

10.1117/1.OE.51.10.104003

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Mercury cadmium telluride (HgCdTe) processing must be performed at a low temperature in order to reduce Hg depletion. To meet demand, low-temperature plasma enhanced atomic layer deposition (PE-ALD) is an emerging deposition technology for highly conformal thin films. We comparatively studied the effectiveness of low-temperature PE-ALD by measuring the ALD film roughness, thickness, and dielectric values. Conformal deposition was investigated through scanning electron microscopy images of the Al2O3 film deposited onto high aspect ratio features dry-etched into HgCdTe. PE-ALD demonstrated conformal coatings of trenches, pillars and holes in advanced HgCdTe infrared sensor architectures. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [ DOI: 10.1117/1.OE.51.10.104003]

引用

页数：4

共 7 条

[1] Improvement in the ability to block Hg out diffusion from Hg1-xCdxTe by hydrogenation
Anjali
Srivastava, P.
Mohapatra, S.
Pal, R.
Vyas, H. P.
Sekhar, B. R.
Sehgal, H. K.
[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2006, 21 (08) : 998 - 1001
[2] Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
Goldstein, David N.
McCormick, Jarod A.
George, Steven M.
[J]. JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (49) : 19530 - 19539
[3] Low-temperature Al2O3 atomic layer deposition
Groner, MD
Fabreguette, FH
Elam, JW
George, SM
[J]. CHEMISTRY OF MATERIALS, 2004, 16 (04) : 639 - 645
[4] Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
Kaariainen, Tommi O.
Cameron, David C.
[J]. PLASMA PROCESSES AND POLYMERS, 2009, 6 : S237 - S241
[5] Atomic layer deposition of aluminum oxide on hydrophobic and hydrophilic surfaces
Kobayashi, Nobuhiko P.
Donley, Carrie L.
Wang, Shih-Yuan
Williams, R. Stanley
[J]. JOURNAL OF CRYSTAL GROWTH, 2007, 299 (01) : 218 - 222
[6] CHARACTERIZATION OF (HG,CD)TE BY THE PHOTOCONDUCTIVE DECAY TECHNIQUE
LOPES, VC
WRIGHT, WH
SYLLAIOS, AJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (02): : 1167 - 1170
[7] MINORITY-CARRIER LIFETIME IN MERCURY CADMIUM TELLURIDE
LOPES, VC
SYLLAIOS, AJ
CHEN, MC
[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1993, 8 (06) : 824 - 841

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