Influence of metalorganic chemical vapor deposition growth conditions on In-rich nanoislands formation in InGaN/GaN structures

被引:30
作者
Musikhin, YG
Gerthsen, D
Bedarev, DA
Bert, NA
Lundin, WV
Tsatsul'nikov, AF
Sakharov, AV
Usikov, AS
Alferov, ZI
Krestnikov, IL
Ledentsov, NN
Hoffmann, A
Bimberg, D
机构
[1] Univ Karlsruhe, Lab Elektronenmikroskopie, D-76128 Karlsruhe, Germany
[2] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[3] Tech Univ Berlin, Inst Festkorperphys, D-10623 Berlin, Germany
关键词
D O I
10.1063/1.1462868
中图分类号
O59 [应用物理学];
学科分类号
摘要
The influence of different growth conditions on the In distribution in ultrathin InGaN insertions in a GaN matrix is investigated by high-resolution transmission electron microscopy and an appropriate image evaluation technique. It is demonstrated that the indium distribution represents dense arrays of In-rich nanodomains inserted in a layer with a lower indium concentration. The sizes of the In-rich regions are about 4-5 nm at a growth temperature of 720 degreesC. Increasing the growth temperature leads to a strong decrease in the of nanoisland density and, also, a moderate decrease in their lateral size. Increasing the trimethylindium/trimethylgallium ratio strongly increases the density of the islands, but the lateral size remains weakly effected. The observations are in agreement with a thermodynamic model of island formation including entropy effects. (C) 2002 American Institute of Physics.
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收藏
页码:2099 / 2101
页数:3
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