Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly

被引：87
|
作者：
Jeong, Jae Won [1 ]
Park, Woon Ik [1 ]
Do, Lee-Mi [2 ]
Park, Jong-Hyun [3 ]
Kim, Tae-Heon [3 ]
Chae, Geesung [3 ]
Jung, Yeon Sik [1 ]
机构：
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] ETRI, RFID USN Res Dept, Taejon 305700, South Korea
[3] LG Display Co Ltd, Mat R&D Dept, Paju Si 413811, Gyeonggi Do, South Korea
来源：
ADVANCED MATERIALS | 2012年 / 24卷 / 26期
关键词：
nanotransfer printing; soft lithography; block copolymers; self-assembly; polydimethylsiloxane; BLOCK-COPOLYMERS; NANOFABRICATION; PATTERNS; ARRAYS; NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; SURFACES; FEATURES; DENSITY;
D O I：
10.1002/adma.201200356
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach is realized by achieving the uniform self-assembly of polydimethylsiloxane (PDMS)-containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non-planar substrates without pretreatments. The fabrication of well-aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：3526 / 3531
页数：6
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