Nanotransfer Printing with sub-10 nm Resolution Realized using Directed Self-Assembly

被引：87
|
作者：
Jeong, Jae Won [1 ]
Park, Woon Ik [1 ]
Do, Lee-Mi [2 ]
Park, Jong-Hyun [3 ]
Kim, Tae-Heon [3 ]
Chae, Geesung [3 ]
Jung, Yeon Sik [1 ]
机构：
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[2] ETRI, RFID USN Res Dept, Taejon 305700, South Korea
[3] LG Display Co Ltd, Mat R&D Dept, Paju Si 413811, Gyeonggi Do, South Korea
来源：
ADVANCED MATERIALS | 2012年 / 24卷 / 26期
关键词：
nanotransfer printing; soft lithography; block copolymers; self-assembly; polydimethylsiloxane; BLOCK-COPOLYMERS; NANOFABRICATION; PATTERNS; ARRAYS; NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; SURFACES; FEATURES; DENSITY;
D O I：
10.1002/adma.201200356
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
An extraordinarily facile sub-10 nm fabrication method using the synergic combination of nanotransfer printing and the directed self-assembly of block copolymers is introduced. The approach is realized by achieving the uniform self-assembly of polydimethylsiloxane (PDMS)-containing block copolymers on a PDMS mold through the stabilization of the block copolymer thin films. This simple printing method can be applied on oxides, metals, polymers, and non-planar substrates without pretreatments. The fabrication of well-aligned metallic and polymeric functional nanostructures and crossed wire structures is also presented. © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：3526 / 3531
页数：6
相关论文
共 50 条
  • [31] A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon Containing Block Copolymers
    Blachut, Gregory
    Sirard, Stephen M.
    Maher, Michael J.
    Asano, Yusuke
    Someya, Yasunobu
    Lane, Austin P.
    Durand, William J.
    Bates, Christopher M.
    Dinhobl, Andrew M.
    Gronheid, Roel
    Hymes, Diane
    Ellison, Christopher J.
    Willson, C. Grant
    CHEMISTRY OF MATERIALS, 2016, 28 (24) : 8951 - 8961
  • [32] Ionic Liquids as Additives to Polystyrene-Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features
    Chen, Xuanxuan
    Zhou, Chun
    Chen, Shuang-Jun
    Craig, Gordon S. W.
    Rincon-Delgadillo, Paulina
    Dazai, Takahiro
    Miyagi, Ken
    Maehashi, Takaya
    Yamazaki, Akiyoshi
    Gronheid, Roel
    Stoykovich, Mark P.
    Nealey, Paul F.
    ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (19) : 16747 - 16759
  • [33] Sub-30 nm via interconnects fabricated using directed self-assembly
    Kato, Hirokazu
    Seino, Yuriko
    Yonemitsu, Hiroki
    Sato, Hironobu
    Kanno, Masahiro
    Kobayashi, Katsutoshi
    Kawanishi, Ayako
    Imamura, Tsubasa
    Omura, Mitsuhiro
    Nakamura, Naofumi
    Azuma, Tsukasa
    MICROELECTRONIC ENGINEERING, 2013, 110 : 152 - 155
  • [34] Directed Self-Assembly at the 10 nm Scale by Using Capillary Force-Induced Nanocohesion
    Duan, Huigao
    Berggren, Karl K.
    NANO LETTERS, 2010, 10 (09) : 3710 - 3716
  • [35] Self- assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
    Gottlieb, S.
    Rosner, B.
    Evangelio, L.
    Fernandez-Regulez, M.
    Nogales, A.
    Garcia-Gutierrez, M. C.
    Keller, T. F.
    Fraxedas, J.
    Ezquerra, T. A.
    David, C.
    Perez-Murano, F.
    MOLECULAR SYSTEMS DESIGN & ENGINEERING, 2019, 4 (01) : 175 - 185
  • [36] Simulation Study of Directed Self-Assembly for 10-nm Pattern Formation
    Kim, Sang-Kon
    Oh, Hye-Keun
    Jung, Young-Dae
    An, Ilsin
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2, 2010, 7639
  • [37] Topographically designed hybrid nanostructures via nanotransfer printing and block copolymer self-assembly
    Park, Tae Wan
    Jung, Hyunsung
    Park, Jinyoung
    Ahn, Yong-Sik
    Hong, Suck Won
    Lee, Junghoon
    Lee, Jong-Heun
    Park, Woon Ik
    NANOSCALE, 2021, 13 (25) : 11161 - 11168
  • [38] Plasmonic nanocavities fabricated by directed self-assembly lithography and nanotransfer printing and used as surface-enhanced Raman scattering substrates
    Lin, Chun-Wei
    Chang, Shih-Hui
    Huang, Chih-Chia
    Lin, Chun-Hung
    MICROELECTRONIC ENGINEERING, 2020, 227 (227)
  • [39] Spontaneous Registration of Sub-10 nm Features Based on Subzero Celsius Spin-Casting of Self-Assembling Building Blocks Directed by Chemically Encoded Surfaces
    Lee, Jung Hye
    Choi, Hak-Jong
    Lee, ChulHee
    Song, Seung Won
    Lee, Joong Bum
    Huh, Daihong
    Nam, Yoon Sung
    Jeon, Duk Young
    Lee, Heon
    Jung, Yeon Sik
    ACS NANO, 2018, 12 (08) : 8224 - 8233
  • [40] Self-Assembly of Carbohydrate-block-Poly(3-hexylthiophene) Diblock Copolymers into Sub-10 nm Scale Lamellar Structures
    Sakai-Otsuka, Yoko
    Zaioncz, Soraia
    Otsuka, Issei
    Halila, Sami
    Rannou, Patrice
    Borsali, Redouane
    MACROMOLECULES, 2017, 50 (08) : 3365 - 3376
12345