Application of SiOx:H/bi-SiNx:H/SiOx:H stacked coatings embedded by silicon nanocrystals on crystalline silicon solar cells with nanowire texturing
被引:2
作者:
Ma, Xiao-Bo
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机构:
Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Ma, Xiao-Bo
[1
]
Zhang, Wei-Jia
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机构:
Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Zhang, Wei-Jia
[1
]
Zhang, Wei
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机构:
Inner Mongolia Junzheng Energy & Chem Grp Co Ltd, Wuhai 016000, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Zhang, Wei
[2
]
Ma, Qiang
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Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Ma, Qiang
[1
]
Fan, Zhi-Qiang
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Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Fan, Zhi-Qiang
[1
]
Ma, Deng-Hao
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Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Ma, Deng-Hao
[1
]
Jiang, Zhao-Yi
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Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Jiang, Zhao-Yi
[1
]
Zhang, Yu-Long
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Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R ChinaBeihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
Zhang, Yu-Long
[1
]
机构:
[1] Beihang Univ, Mat Phys & Chem Res Ctr, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China
[2] Inner Mongolia Junzheng Energy & Chem Grp Co Ltd, Wuhai 016000, Peoples R China
Solar cells;
Luminescent down shifting effect;
Nanowires;
Silicon nanocrystals;
CHEMICAL-VAPOR-DEPOSITION;
BLACK-SILICON;
CARRIER RECOMBINATION;
NITRIDE;
FILMS;
PASSIVATION;
LAYER;
EFFICIENCY;
DESIGN;
SINX;
D O I:
10.1016/j.tsf.2017.01.009
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In this study, a SiOx:H/bi-SiNx:H/SiOx:H quadruple-layer anti-reflective coatings embedded by silicon nanocrystals (Si-NC ARCS) was deposited on an n-type monocrystalline silicon base solar cell with nanowire texturing, by means of plasma enhancing chemical vapor deposition. The average reflection of the Si-NC ARCs on the polished silicon wafer was 4.97% (300-1000 nm). The minority carrier lifetime of the silicon wafer with nanowire texturing was boosted by nearly 39 times after the Si-NC ARCs were deposited. Moreover, the Si-NC ARCs showed a significant luminescent down shifting effect (LDS), with strong absorbing at the blue-ultraviolet region, followed by re-emitting at the red-near-infrared region, thereby modifying the sunlight spectrum before they reached the solar cell, and thus obtaining a better spectrum response. After depositing the Si-NC ARCs without a significant increase in the cell cost, the external quantum efficiencies, short circuit current density and photo-conversion efficiency of the solar cell with nanowire texturing were significantly improved. (C) 2017 Elsevier B.V. All rights reserved.
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Kim, TY
;
Park, NM
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Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Park, NM
;
Kim, KH
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机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Kim, KH
;
Sung, GY
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h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Sung, GY
;
Ok, YW
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机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Ok, YW
;
Seong, TY
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机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Seong, TY
;
Choi, CJ
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机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Kim, TY
;
Park, NM
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Park, NM
;
Kim, KH
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Kim, KH
;
Sung, GY
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Sung, GY
;
Ok, YW
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Ok, YW
;
Seong, TY
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea
Seong, TY
;
Choi, CJ
论文数: 0引用数: 0
h-index: 0
机构:
Elect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South KoreaElect & Telecommun Res Inst, Future Technol Res Div, Taejon 305350, South Korea