Effect of a silicon nitride film on the potential-induced degradation of n-type front-emitter crystalline silicon photovoltaic modules

被引:12
作者
Suzuki, Tomoyasu [1 ]
Masuda, Atsushi [2 ,3 ,4 ]
Ohdaira, Keisuke [1 ]
机构
[1] Japan Adv Inst Sci & Technol, Nomi, Ishikawa 9231292, Japan
[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
[3] Niigata Univ, Grad Sch Sci & Technol, Niigata 9502181, Japan
[4] Niigata Univ, Niigata 9502181, Japan
关键词
potential-induced degradation; photovoltaic module; n-type crystalline silicon solar cell; silicon nitride; sodium; SOLAR-CELLS; CURRENT-DENSITY; SODIUM; DECORATION; DEFECTS; VOLTAGE;
D O I
10.35848/1347-4065/abb39e
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the effect of silicon nitride (SiNx) films in n-type front-emitter (n-FE) crystalline Si (c-Si) solar cells on the potential-induced degradation (PID) of n-FE photovoltaic (PV) modules. A negative-bias PID test for a few min does not degrade the performance of PV modules with n-FE cells without SiNx/Si dioxide (SiO2) stacks, unlike in the case of PV modules with cells with SiNx/SiO2. This is because of the absence of polarization-type PID. After a longer PID test, the PV modules with n-FE cells without SiNx/SiO(2)show a slower decrease in fill factor (FF), originating from Na introduction into the depletion layer of a p-n junction, than the modules with cells with SiNx/SiO2. The mitigation of PID by eliminating SiN(x)is partly consistent with the results of PV modules with p-type conventional cells without SiN(x)in which no PID occurs. SiN(x)thus has a function of enhancing Na introduction into c-Si.
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页数:5
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