The investigation of physicochemical processes of silica glass doping with fluorine by the MCVD method

被引：3
|
作者：
Eron'yan, M. A. [1 ]
机构：
[1] All Russia Sci Ctr, Res & Technol Inst Opt Mat, St Petersburg 193171, Russia
来源：
GLASS PHYSICS AND CHEMISTRY | 2013年 / 39卷 / 03期
关键词：
silica glass; the MCVD process; doping of silica glass with fluorine; small fluorine additives; the dependence of the refraction index on fluorination reagent pressure; DEPOSITION; DIFFUSION; CENTERS;
D O I：
10.1134/S1087659613030073
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The temperature-time dependences for sintering and fluorination processes of SiO2 nanoparticles obtained by the method of chemical vapor deposition are presented. It has been revealed that at the SiF4 pressure of 1 atm, the intensive agglomeration of high-dispersive layers prevents the achievement of equilibrium between the fluorine-containing gas media and the condensed phase. The saturation of the porous layers with fluorine occurs at temperatures less than 1100A degrees C, when the sintering duration of high-dispersive particles is substantially longer than the fluorination process time.
引用
收藏
页码：279 / 284
页数：6
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