Low frequency noise versus temperature spectroscopy of recently designed Ge JFETs

被引:40
作者
Grassi, V
Colombo, CF
Camin, DV
机构
[1] Univ Milan, Dipartimento Fis, I-20133 Milan, Italy
[2] Ist Nazl Fis Nucl, I-20133 Milan, Italy
关键词
Ge JFETs; generation-recombination (GR) noise; low frequency noise versus temperature spectroscopy (LFN versus T); low temperature electronics;
D O I
10.1109/16.974725
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
During the investigation of cryogenic properties of recently developed Ge JFETs we have applied the technique known in literature as low frequency noise versus temperature spectroscopy (LFN versus T). Using this method we have determined the energy levels of traps associated to Lorentzian noise found in the 30 to 40 K temperature range. To perform this task we have developed a computer-controlled experimental setup able to set the temperature within +/-5 mK in the range 4 to 300 K during a spectral noise measurement. An approach for the calculation of the uncertainties that affect the evaluation of traps parameter is presented.
引用
收藏
页码:2899 / 2905
页数:7
相关论文
共 19 条
[1]  
BLONDEEL A, 1997, J APPL PHYS, V81
[2]  
CAMIN DV, 2000, 4 WORKSH LOW TEM WPP, V171, P151
[3]   TEMPERATURE DEPENDENCE OF LOW-FREQUENCY EXCESS NOISE IN JUNCTION-GATE FETS [J].
HASLETT, JW ;
KENDALL, EJM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1972, ED19 (08) :943-+
[4]   LOW-FREQUENCY NOISE SPECTROSCOPY [J].
JONES, BK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (11) :2188-2197
[5]  
KIRSCHMAN RK, 1992, P SOC PHOTO-OPT INS, V1684, P110, DOI 10.1117/12.60500
[6]   Constant-resistance deep-level transient spectroscopy in Si and Ge JFET's [J].
Kolev, PV ;
Deen, MJ ;
Kierstead, J ;
Citterio, M .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (01) :204-213
[7]  
LAX M, 1959, J PHYS CHEM SOLIDS, V8, P99
[8]  
LENGELER B, 1974, CRYOGENIC AUG, P439
[9]  
MILNES AG, 1973, DEEP IMPURITIES SEMI
[10]  
*NAT INSTR CORP, LABV REF MAN