Doping of silica glass with fluorine by the modified chemical vapor deposition method

被引：1

作者：

Andreev, A. G. ^{[1
]}

Bureev, V. S. ^{[2
]}

Eronyan, M. A. ^{[2
]}

Kryukov, I. I. ^{[1
]}

Mazunina, T. V. ^{[1
]}

Serkov, M. M. ^{[2
]}

机构：

[1] JSC Perm Res & Prod Instrument Co, Perm 614990, Russia

[2] All Russian Res Ctr, JSC Res & Technol Inst Opt Mat, SI Vavilov State Opt Inst, St Petersburg 193171, Russia

来源：

GLASS PHYSICS AND CHEMISTRY | 2013年 / 39卷 / 03期

关键词：

silica glass; MCVD process; doping of silica glass with fluorine; low doping amounts of fluorine; dependency of refractive index on pressure of fluorinating reagent; MCVD;

D O I：

10.1134/S1087659613030024

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

It is demonstrated that the process of doping of silica glass by the modified method of chemical vapor-phase deposition changes principally in the case of a particularly low flow rate of the fluorinating reagent. An interpretation of specific features of the mechanism of doping of silica glass with fluorine at a particularly low content of a fluorine-containing reagent in the initial vapor-gas mixture is provided.

引用

页码：285 / 286

页数：2

共 6 条

[1] Properties of fluorosilicate glass prepared by MCVD [J].

Aksenov, V. A. ;

Ivanov, G. A. ;

Iskhakova, L. D. ;

Likhachev, M. E. ;

Chernook, S. G. ;

Shushpanov, O. E. .

INORGANIC MATERIALS, 2010, 46 (10) :1151-1154

[2] MCVD of fluorosilicate glass [J].

Aksenov, V. A. ;

Ivanov, G. A. ;

Isaev, V. A. ;

Likhachev, M. E. .

INORGANIC MATERIALS, 2010, 46 (09) :994-997

[3] Investigation into doping of silica glasses with fluorine by modified chemical vapor deposition [J].

Andreev, AG ;

Dukel'skii, KV ;

Ermakov, VS ;

Eron'yan, MA ;

Kryukov, II ;

Petrovski, GT ;

Serkov, MM ;

Tsibinogina, MK .

GLASS PHYSICS AND CHEMISTRY, 2006, 32 (01) :33-37

[4] Thermodynamics of fluorine incorporation into silica glass [J].

Kirchhof, J. ;

Unger, S. .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (2-9) :540-545

[5] Fluorine incorporation in silica glass by MCVD process - A critical study [J].

Paul, MC ;

Sen, R ;

Bandyopadhyay, T .

JOURNAL OF MATERIALS SCIENCE, 1997, 32 (13) :3511-3516

[6]

Walker KL, 1983, 6 TOP M OPT FIB COMM, P36, DOI 10.1364/OFC.1983.TuA7

← 1 →