By first-principles analysis, we investigate the effect of thermal annealing on structural stability of CoFeB/MgO(thin)/CoFeB magnetic tunnel junctions. The calculated phonon dispersion indicates that Mg3B2O6 (kotoite) is a stable spacer after annealing due to B diffusion into MgO. The calculated tunneling magnetoresistance (TMR) of CoFe/kotoite/CoFe is 210%, which is in good agreement with the available experimental value and 2 orders of magnitude lower than the predicted values of CoFe/MgO/CoFe junctions. The physics of this more realistic TMR value is the change in symmetry from C-4v of MgO to C-2v of kotoite. Such symmetry reduction induces scattering and weakens the tunneling transmission of the Delta(1)-like Bloch states. Our calculations also reveal that the tunneling transmission is sensitive to the electrode/spacer interfacial chemical bonding. Residual boron, localized at the interface due to insufficient annealing temperature, can further reduce the TMR. DOI: 10.1103/PhysRevB.87.014114
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Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Bae, J. Y.
Lim, W. C.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Lim, W. C.
Kim, H. J.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, H. J.
Lee, T. D.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Lee, T. D.
Kim, K. W.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, K. W.
Kim, T. W.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
机构:
Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South KoreaKorea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Bae, J. Y.
Lim, W. C.
论文数: 0引用数: 0
h-index: 0
机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Lim, W. C.
Kim, H. J.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, H. J.
Lee, T. D.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Lee, T. D.
Kim, K. W.
论文数: 0引用数: 0
h-index: 0
机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
Kim, K. W.
Kim, T. W.
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机构:Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea