Size-controlled growth of nanoparticles in a highly ionized pulsed plasma

被引：37

作者：

Pilch, I. ^{[1
]}

Soderstrom, D. ^{[1
]}

Brenning, N. ^{[2
]}

Helmersson, U. ^{[1
]}

机构：

[1] Linkoping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linkoping, Sweden

[2] Royal Inst Technol, Sch Elect Engn, Div Space & Plasma Phys, SE-10044 Stockholm, Sweden

来源：

APPLIED PHYSICS LETTERS | 2013年 / 102卷 / 03期

基金：

瑞典研究理事会;

关键词：

MAGNETRON; CLUSTER;

D O I：

10.1063/1.4788739

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Copper nanoparticles (NPs) were synthesized using a high power pulsed hollow cathode technique and the produced NPs were studied as a function of pulse parameters, i.e., frequency, peak current, and pulse width. It was found that the particle size can be altered in a range from 10 to 40 nm by changing any one of the pulse parameters. The mechanisms of NP synthesis with respect to a pulsed discharge and a high degree of ionization of the sputtered material are discussed. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4788739]

引用

页数：4

共 26 条

[11]

Hasan M., 2011, THESIS ROYAL I TECHN

[12] Formation and size control of a Ni cluster by plasma gas condensation [J].

Hihara, T ;

Sumiyama, K .

JOURNAL OF APPLIED PHYSICS, 1998, 84 (09) :5270-5276

[13] Ion collection by a sphere in a flowing plasma: 3. Floating potential and drag force [J].

Hutchinson, IH .

PLASMA PHYSICS AND CONTROLLED FUSION, 2005, 47 (01) :71-87

[14] HIGH-RATE LOW KINETIC-ENERGY GAS-FLOW-SPUTTERING SYSTEM [J].

ISHII, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (02) :256-258

[15] ANALYTIC MODEL OF THE HOLLOW-CATHODE EFFECT [J].

KOLOBOV, VI ;

TSENDIN, LD .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (04) :551-560

[16] A novel pulsed magnetron sputter technique utilizing very high target power densities [J].

Kouznetsov, V ;

Macák, K ;

Schneider, JM ;

Helmersson, U ;

Petrov, I .

SURFACE & COATINGS TECHNOLOGY, 1999, 122 (2-3) :290-293

[17]

Lieberman MA, 2005, PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING, 2ND EDITION, P1

[18]

Linic S, 2011, NAT MATER, V10, P911, DOI [10.1038/NMAT3151, 10.1038/nmat3151]

[19]

Matsui I, 2006, J NANOPART RES, V8, P429, DOI [10.1007/s11051-005-9009-x, 10.1007/S11051-005-9009-x]

[20] Nanoparticle catalysts [J].

Moshfegh, A. Z. .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (23)

← 1 2 3 →