Size-controlled growth of nanoparticles in a highly ionized pulsed plasma

被引：37

作者：

Pilch, I. ^{[1
]}

Soderstrom, D. ^{[1
]}

Brenning, N. ^{[2
]}

Helmersson, U. ^{[1
]}

机构：

[1] Linkoping Univ, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linkoping, Sweden

[2] Royal Inst Technol, Sch Elect Engn, Div Space & Plasma Phys, SE-10044 Stockholm, Sweden

来源：

APPLIED PHYSICS LETTERS | 2013年 / 102卷 / 03期

基金：

瑞典研究理事会;

关键词：

MAGNETRON; CLUSTER;

D O I：

10.1063/1.4788739

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Copper nanoparticles (NPs) were synthesized using a high power pulsed hollow cathode technique and the produced NPs were studied as a function of pulse parameters, i.e., frequency, peak current, and pulse width. It was found that the particle size can be altered in a range from 10 to 40 nm by changing any one of the pulse parameters. The mechanisms of NP synthesis with respect to a pulsed discharge and a high degree of ionization of the sputtered material are discussed. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4788739]

引用

页数：4

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