Study of the composition of titanium oxide films deposited by reactive magnetron sputtering

被引：0
作者：
Aubakirova, D. [1 ]
Yerdybaeva, N. [1 ]
Pichugin, V [2 ]
机构：
[1] D Serikbayev East Kazakhstan State Tech Univ, Ust Kamenogorsk, Kazakhstan
[2] Tomsk Polytech Univ, Tomsk, Russia
来源：
RECENT CONTRIBUTIONS TO PHYSICS | 2020年 / 74卷 / 03期
关键词：
D O I：
10.26577/RCPh.2020.v74.i3.06
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：43 / 45
页数：3
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